We report on the fabrication and characterization of waveguide thin films on silicon by ultraviolet-light imprinting in a new photosensitive, organically modified aluminophosphate sol-gel silica glass prepared by a one-step dip-coating process. The effect of fabrication parameters such as dip-coating speed, bake temperature, ultraviolet-light exposure time and sol age on the thin film characteristics (thickness, refractive index and birefringence) are studied. Appropriate combinations of ultraviolet-light exposure time, sol-gel film thickness and postbake parameters produce waveguides suitable for optical telecommunication applications.