Thin Solid Films, Vol.313-314, 406-415, 1998
Complementary in-situ and post-deposition diagnostics of thin film semiconductor structures
In-situ and in-line monitoring techniques based on spectroscopic ellipsometry and laser light scattering have been used for process definition and to provide insights into process science in the strained SiGe/Si system. The development of the techniques for real-time closed loop control of alloy composition and growth rate are discussed with emphasis on the requirements for rapid data analysis. Crown