Thin Solid Films, Vol.332, No.1-2, 74-79, 1998
Sputtering process of carbon nitride films by using a novel bio-molecular C-N containing target
In order to reduce the activation energy barrier for the formation of carbon nitride during ion beam sputtering, a novel bio-molecular target material, instead of the conventional graphite target, is successfully developed to deposit the crystalline carbon nitride films. The adenine target consists of a high N/C ratio as well as a 6-fold carbonitro-ring structure similar to that in the hypothetical C3N4. The mass spectrum of adenine indicates the existence of 11 main carbonitro-hydrogen containing species. Thus, the adenine target is anticipated to enhance the nucleation and growth of carbon nitride films by providing abundant carbonitro-hydrogen containing species as intermediate states. X-ray photoelectron spectrum analyses of these films indicated the presence of C and N in the films, with high nitrogen to carbon ratio at about 0.48. Both infrared and Raman spectroscopies confirm the chemical bonding between the carbon and nitrogen. X-ray and electron diffraction indicates the presence of crystalline carbon nitride in the film.
Keywords:CHEMICAL-VAPOR-DEPOSITION;THIN-FILMS