TW films with thicknesses of 2000-5600 Angstrom, were reactively deposited on high speed tool and alloy tool steels in an atmosphere of Ar and N-2, using facing targets sputtering. The maximum deposition rate of the film was 0.26 Angstrom/min/W. TiN(111), TiN(200), TiN(220) and TiN(311) peaks were observed from the X-ray diffraction patterns. Ti(011) and Ti2N(202) peaks were also observed in high speed tool steels. All films deposited in this study showed a golden color. When the gas flow rate (N-2/Ar) and the substrate temperature were 0.5 and 480 degrees C, respectively, the film composition approached stoichiometry (Ti : N = 1 : 1), where the lowest resistivity, and maximum tangential force of the film were 110 mu Omega cm, and 10 N, respectively.