Thin Solid Films, Vol.358, No.1-2, 187-190, 2000
Pulsed laser deposition of aluminum tris-8-hydroxyquinline thin films
Aluminum tris-8-hydroxyquinline (Alq(3)) thin films have been successfully fabricated by 355 nm pulsed laser deposition. Alq(3) films are characterized via photoluminescence, X-ray diffraction and Fourier transform infrared spectroscopy. The films deposited using laser fluence of less than 25 mJ/cm(2) exhibit amorphous feature and maintain the same composition as the original target. Photoluminescence from Alq(3) film obtained in air is efficient and stable. After exposed to humid air (100% relative humidity) for a week, Alq3 films still keep the same composition and crystallinity as the as-deposited film. The stability of Alq(3) film can be improved by poly(vinylcarbazole) doping or depositing in Ar ambient.