A high-efficiency deposition technique, electrostatic assisted aerosol jet deposition (EAAJD), has been used to prepare CdS, CdSe and ZnS thin films in an open atmosphere. The EAAJD method exhibited a higher deposition efficiency and film growth rate than conventional spray pyrolysis and chemical vapour deposition methods. The CdS and ZnS films produced using the EAAJD process showed a strong preferred orientation. Fine crystalline CdS and CdSe (grain size <200 nm) films were formed at temperatures as low as 300 degrees C. ZnS film required a higher deposition temperature (>450 degrees C) which resulted in large grain size (grain size ca. 500 nm). The optical properties of the CdS and CdSe showed that their bandgap values were very close to the values reported in literatures, indicating their potentials for the photovoltaic applications.