Thin Solid Films, Vol.368, No.2, 253-256, 2000
Projective phase diagrams for CVD diamond growth from C-H and C-H-O systems
Phase diagrams for chemical vapor deposition (CVD) diamond growth from C-H and C-H-O systems were calculated according to the non-equilibrium thermodynamic coupling model. As compared with a large quantity of experimental facts, the theoretical predictions agreed well with the experiments. The theoretical results can not only solve the conflict between the classical equilibrium thermodynamics and CVD diamond growth under low pressure, but also give quantitative predictions for optimizing experimental conditions.
Keywords:CHEMICAL-VAPOR-DEPOSITION;MAGNETOMICROWAVE PLASMA CVD;RESONANCE MICROWAVE PLASMA;LOW SUBSTRATE TEMPERATURES;LOW-PRESSURE;MIXED-GAS;THIN-FILMS;CARBON-DIOXIDE;HYDROGEN GAS;100 SILICON