Electrochemical Synthesis of Ba- and Sr-Based Titanate Thin Films using Ti Electrode Prepared by RF Sputtering

Jae Hong Kim; Jinwook Kang; Geon-Joong Kim; Yongsug Tak

Korean Journal of Chemical Engineering, Vol.18, No.3, 297-302, May, 2001

DOI10.1007/BF02699168 Export Citation

Electrochemical Synthesis of Ba- and Sr-Based Titanate Thin Films using Ti Electrode Prepared by RF Sputtering

Jae Hong Kim, Jinwook Kang, Geon-Joong Kim , and Yongsug Tak^†

Department of Chemical Engineering, Inha University, Inchon 402-751, Korea

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Barium and strontium titanate films were electrochemically synthesized onto Ti thin film prepared by RF sputtering. Applied current waveform was modulated to investigate the film growth mechanism. Superimposed cathodic pulses accelerated the formation of titanate thin films, and both the electrode surface pH and (Ba(2+), Sr(2+)) ion size had a strong influence on film formation. Titanate film formation mechanism was investigated with a scanning electron microscope, an X-ray diffractometer and an electrochemical quartz crystal microbalance (EQCM). In-situ mass change of Ti electrode during electrolysis indicated that electrochemical method sets a limit to film growth.

Keywords:Barium Strontium Titanate;Electrochemical Method;Current Pulse Waveform;Electrochemical Quartz Crystal Microbalance;Film Growth

[References]

Bacsa RR, Rutsch G, Dougherty JP, J. Mater. Res., 11, 194 (1996)
Bard AJ, Faulkner LR, "Electrochemical Methods: Fundamentals and Applications," John Wiley & Sons, 700 (1980)
Baumert BA, Chang LH, Matsuda AT, Tracy CJ, J. Mater. Res., 13, 197 (1998)
Bendale P, Venigalla S, Ambrose JR, Verink ED, Adair JH, J. Am. Ceram. Soc., 76, 2619 (1996)
Hoffmann T, Doll T, Fuenzalida VM, J. Electrochem. Soc., 144(11), L292 (1997)
Hori Y, Suzuki S, J. Electrochem. Soc., 130, 2390 (1983)
Kajiyoshi K, Hamaji Y, Tomono K, Kasanami T, Yoshimura M, J. Am. Ceram. Soc., 79, 613 (1996)
Kajiyoshi K, Tomono K, Hamaji Y, Kasanami T, Yoshimura M, J. Am. Ceram. Soc., 78, 1521 (1995)
Kajiyoshi K, Yoshimura M, Hamaji Y, Tomono K, Kasanami T, J. Mater. Res., 11, 169 (1996)
Othsuka T, Masuda M, Sato N, J. Electrochem. Soc., 132, 787 (1985)
Pasierb P, Komornicki S, Radecka M, Thin Solid Films, 324(1-2), 134 (1998)
Schaffer JP, Saxena A, Antolovich SD, Sanders TH, Warner SB, "The Science and Design of Engineering Materials," Richard D. Irwin, Inc., Chicago (1995)
Seo KW, Kong HG, Korean J. Chem. Eng., 17(4), 428 (2000)
Seo KW, Kong HG, Korean J. Chem. Eng., 17(4), 455 (2000)
Takeshima Y, Shiratsuyu K, Takagi H, Sakabe Y, Jpn. J. Appl. Phys., 36, 5870 (1997)
Tsuzuki A, Kato K, Kusumoto K, Torii Y, J. Mater. Sci., 33(12), 3055 (1998)
Venigalla S, Bendale P, Adair JH, J. Electrochem. Soc., 142(6), 2101 (1995)
Xu WP, Zheng L, Xin H, Lin C, J. Mater. Res., 11, 821 (1996)
Yoshimura M, Suchanek W, Watanabe T, Sakurai B, J. Mater. Res., 13, 875 (1998)

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[2] Bard AJ, Faulkner LR, "Electrochemical Methods: Fundamentals and Applications," John Wiley & Sons, 700 (1980)

[3] Baumert BA, Chang LH, Matsuda AT, Tracy CJ, J. Mater. Res., 13, 197 (1998)

[4] Bendale P, Venigalla S, Ambrose JR, Verink ED, Adair JH, J. Am. Ceram. Soc., 76, 2619 (1996)

[5] Hoffmann T, Doll T, Fuenzalida VM, J. Electrochem. Soc., 144(11), L292 (1997)

[6] Hori Y, Suzuki S, J. Electrochem. Soc., 130, 2390 (1983)

[7] Kajiyoshi K, Hamaji Y, Tomono K, Kasanami T, Yoshimura M, J. Am. Ceram. Soc., 79, 613 (1996)

[8] Kajiyoshi K, Tomono K, Hamaji Y, Kasanami T, Yoshimura M, J. Am. Ceram. Soc., 78, 1521 (1995)

[9] Kajiyoshi K, Yoshimura M, Hamaji Y, Tomono K, Kasanami T, J. Mater. Res., 11, 169 (1996)

[10] Othsuka T, Masuda M, Sato N, J. Electrochem. Soc., 132, 787 (1985)

[11] Pasierb P, Komornicki S, Radecka M, Thin Solid Films, 324(1-2), 134 (1998)

[12] Schaffer JP, Saxena A, Antolovich SD, Sanders TH, Warner SB, "The Science and Design of Engineering Materials," Richard D. Irwin, Inc., Chicago (1995)

[13] Seo KW, Kong HG, Korean J. Chem. Eng., 17(4), 428 (2000)

[14] Seo KW, Kong HG, Korean J. Chem. Eng., 17(4), 455 (2000)

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[19] Yoshimura M, Suchanek W, Watanabe T, Sakurai B, J. Mater. Res., 13, 875 (1998)