Journal of Materials Science, Vol.36, No.2, 503-510, 2001
9 MeV au ion implantation into Ti and Ti-6Al-4V
Titanium and Ti-6Al-4V alloy samples were implanted with 9 MeV Au ions at room temperature with fluences up to 6.5 x 10(20) ions/m(2). The results were analyzed using Rutherford backscattering, X-ray diffraction, glancing angle X-ray diffraction, and SEM. The glancing angle diffraction patterns show peaks corresponding to a new phase in both materials, presenting an hcp structure with larger lattice parameters than the unimplanted material. This phase is formed mainly by structural damage produced by the beam, and not by the formation of compounds. Modifications of the grain size and microstrain were measured using the Williamson-Hall method.