Structures with self-organised InAs quantum dots in a GaAs matrix were grown by the low pressure metal-organic vapour phase epitaxy (LP-MOVPE) technique. Photoluminescence and atomic force microscopy were used as the main characterisation methods for the growth optimisation. The properties of multiple-stacked quantum dot structures are influenced by the thickness of the GaAs separation layers (spacers) between quantum dot-containing InAs layers, by the InAs layer thickness, by arsine partial pressure during growth, and by group III precursor flow interruption time.