The fabrication of solar cells based on thin silicon film on foreign substrates is an attractive way to realise cheap and efficient photovoltaic devices on a large scale. In this work, we propose an innovative technique to obtain textured monocrystalline Si on mullite owing to the transfer of a nucleation layer and subsequent LPE growth. The nucleation layer (with the shape of a grid) is elaborated by photoelectrochemical etching. The grid pattern parameters will determine the shape of the LPE layer surface, flat or pyramidal textured for efficient light trapping.