This paper presents a new technology for CVD reactors, developed in order to solve several practical problems which limit the efficiency of thin films manufactured in the microelectronic industry. This technology can be scaled down into a perfectly representative small scale pilot plant, very useful for a more rational development of new industrial applications. The first part of the article deals with a description of the equipment, presentation and analysis of a series of experimental results. Four different deposits, of increasing complexity, have been selected for a detailed comparison between the new technology presented here and the classical equipment used in the microelectronic industry.