화학공학소재연구정보센터
Journal of Chemical Physics, Vol.111, No.20, 9125-9128, 1999
The site-specific reactivity of isopropanol in aqueous silicon etching: Controlling morphology with surface chemistry
The site-specific rates of isopropanol reaction on Si(111) were studied by kinetic competition with an etchant of known anisotropy and quantified using concentration-dependent changes in the etched surface morphology using a combination of STM measurements and kinetic Monte Carlo simulations. The isopropoxide ion was identified as the active species.