Journal of Materials Science, Vol.34, No.16, 4051-4055, 1999
The effect of interfacial mixing on Ag/Al2O3 by N+ implantation
The Ag film/Al2O3 implanted with an N ion energy of 110 keV. The ion-induced interfacial mixing were examined using AES, STD and XPS. The frictional coefficient of implanted Ag/Al2O3 in air was determined by Drive friction precise measuring apparatus (DFPM). The influence of N+ implantation on the interfacial chemistry and adhesion of Ag films on Al2O3 substrates was examined, compounds formed by introducing a thin layer between the Ag and the Al2O3 at 1 x 10(1)7 N . cm(-2). This investigation resulted in extensive interfacial grading, and new chemical bonding across the Ag/Al2O3 interfaces. The case for the Ag/Al2O3 reaction lead to the metal ceramic of 13Al(2)O(3) . AlN and alpha-AgAlO2 formation though non equilibrium processes of implantation, and friction decreased in initial cycle where ion implantation of lower vacuum lead to surface carbon film. The combination of these effects provided an adhesion increase that was approximately 3 times that obtained in unimplanted Ag/Al2O3 specimens.