The effects of nitrogen flow ratio, target area ratio of Cr, and substrate temperature on the structure of DC reactive sputtered Fe-Cr-N ternary films have been studied. X-ray diffraction measurements show that Fe-Cr-N films consist of alpha-Fe(Cr) and gamma'-(Fe,Cr)(4)N-x (x < 1) phases. The crystal grain of the alpha-Fe(Cr) phase becomes finer and a (200) texture of the gamma'-(Fe,Cr)(4)N-x phase becomes more marked with increasing the nitrogen flow ratio. X-ray photoelectron spectra of the films show that oxidation resistance of Fe-Cr-N films is superior to that of Fe-N films, and oxides are formed only in the film surface due to contacting with the ambient atmosphere and oxygen contamination is very small in the inner parts of these films.