HALS 그룹을 가진 새로운 고분자형 자외선 안정제의 합성 및 특성

김한식; 채규호; Han Shik Kim; Kyu Ho Chae

Polymer(Korea), Vol.25, No.5, 625-634, September, 2001

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HALS 그룹을 가진 새로운 고분자형 자외선 안정제의 합성 및 특성

Synthesis and Properties of New Polymeric Photostabilizers Containing HALS Groups

김한식, 채규호 ^{1, †}

광주여자대학교 미용과학과, 광주 506-713
¹전남대학교 응용화학부, 광주 500-757

Han Shik Kim, and Kyu Ho Chae^{1, †}

Department of Beauty Science, Kwangju Women's University, Gwangju 506-713, Korea
¹Faculty of Applied Chemistry, Chonnam National University, Gwangju 500-757, Korea

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초록

액상 이소프렌 고무에 무수 밀레산(MAH)을 그라프팅시킨 후 2,2,6,6-tetramethyl-4-piperidinol (TMPO)를 반응시켜 hindered amine light stabilizer (HALS)가 함유된 새로운 고분자형 광안정제를 합성하고, SBR에 대한 광안정제로서의 특성을 관찰하였다. 새로운 고분자형 광안정제의 조성과 물리적 성질은 적정법, GPC 그리고 열중량 분석에 의하여 분석하였다. SBR의 광산화 반응에 대한 고분자형 광안정제의 효과를 254mm 자외선 조사에 따른 자외선 흡광도의 변화, 관능기 변화 그리고 잔막율로서 관찰한 결과, 새로운 고분자형 광안정제를 첨가함으로써 광산화 반응이 효과적으로 억제되었다. 또한, 고분자형 광안정제의 추출내성은 저분자량의 모델 화합물에 비하여 훨씬 우수하였으며, 고분자형 광안정제와 SBR의 상용성은 TMPO가 SBR 필름 표면에 균일하게 고루 분산되어 있어서 매우 우수하였다.

New polymeric photostabilizers containing hindered amine light stabilizer (HALS) were prepared by the reaction of liquid polyisoprene rubber grafted maleic anhydride (MAH) and 2,2,6,6-tetramethyl-4-piperidinol (TMPO). Their chemical composition and physical properties were characterized by titration, GPC and TGA analysis. The effects of polymeric HALS on the photoxidation of the styrene-butadiene rubber were studied from the UV, IR spectral changes, and photo-crosslinking was examined by the measurement of the insoluble fraction. The photoxidation of SBR upon irradiation was inhibited by addition of the new polymeric HALS. The extraction resistance of new polymeric photostabilizer was much better than that of the low molecular weight compound which is prepared by the reaction of MAH and TMPO. The new polymeric HALS are fairly compatible with the SBR.

Keywords:polymeric HALS;photostabilizer;liquid isoprene rubber;TMPO;grafting.

[References]

Klemchuk PP, "Polymer Stabilization and Degradation", ACS Symposium Series 280, American Chemical Society, Washington, DC. (1985)
Decker C, Zahouily K, J. Polym. Sci. A: Polym. Chem., 36(14), 2571 (1998)
Pan JQ, Cheng W, Polym. Degrad. Stabil., 39, 85 (1993)
Schmidt EV, "Exterior Durability of Organic Coatings", FMJ Int. Pub., Redhill, Surrey UK (1988)
Chae KH, Oh JS, Ham HS, J. Photoscience, 3, 167 (1996)
Chae KH, Kim JS, J. Photoscience, 6, 25 (1999)
Pinazzi C, Danjard JC, Pautrat R, "Rubber Chemistry and Technology", p. 282 (1962)
Visconte LLY, Andrade CT, Azuma C, Polym. Bull., 25, 217 (1991)
Jo WH, Park CD, Lee MS, Polymer, 37(9), 1709 (1996)
De Roover B, Sclavons M, Carlier V, Devaux J, Legras R, Momtaz A, J. Polym. Sci. A: Polym. Chem., 33(5), 829 (1995)
Bousquet JA, Fouassier JP, Eur. Polym. J., 23, 367 (1987)
Gonon L, Gardette JL, Polymer, 41(5), 1669 (2000)
Piton M, Rivaton A, Polym. Degrad. Stabil., 53, 343 (1996)
Song KH, Iwamoto A, Tsunooka M, Tanaka M, J. Appl. Polym. Sci., 39, 1769 (1990)

[Referenced By]

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[1] Klemchuk PP, "Polymer Stabilization and Degradation", ACS Symposium Series 280, American Chemical Society, Washington, DC. (1985)

[2] Decker C, Zahouily K, J. Polym. Sci. A: Polym. Chem., 36(14), 2571 (1998)

[3] Pan JQ, Cheng W, Polym. Degrad. Stabil., 39, 85 (1993)

[4] Schmidt EV, "Exterior Durability of Organic Coatings", FMJ Int. Pub., Redhill, Surrey UK (1988)

[5] Chae KH, Oh JS, Ham HS, J. Photoscience, 3, 167 (1996)

[6] Chae KH, Kim JS, J. Photoscience, 6, 25 (1999)

[7] Pinazzi C, Danjard JC, Pautrat R, "Rubber Chemistry and Technology", p. 282 (1962)

[8] Visconte LLY, Andrade CT, Azuma C, Polym. Bull., 25, 217 (1991)

[9] Jo WH, Park CD, Lee MS, Polymer, 37(9), 1709 (1996)

[10] De Roover B, Sclavons M, Carlier V, Devaux J, Legras R, Momtaz A, J. Polym. Sci. A: Polym. Chem., 33(5), 829 (1995)

[11] Bousquet JA, Fouassier JP, Eur. Polym. J., 23, 367 (1987)

[12] Gonon L, Gardette JL, Polymer, 41(5), 1669 (2000)

[13] Piton M, Rivaton A, Polym. Degrad. Stabil., 53, 343 (1996)

[14] Song KH, Iwamoto A, Tsunooka M, Tanaka M, J. Appl. Polym. Sci., 39, 1769 (1990)