Previous Article Next Article Table of Contents Journal of the American Chemical Society, Vol.121, No.39, 9219-9220, 1999 DOI10.1021/ja991707s Export Citation In-situ monitoring of chemical vapor deposition at ambient pressure by surface-enhanced Raman spectroscopy: Initial growth of tantalum(V) oxide on platinum Chan HYH, Takoudis CG, Weaver MJ Please enable JavaScript to view the comments powered by Disqus.
