Thin Solid Films, Vol.351, No.1-2, 21-26, 1999
Design considerations for the AC/DC C-MAG (R) deposition source and power supply system
Throughout the world, process development work in the area of off-line sputter coating is now focused on characterizing and harnessing the benefits of alternating current (AC) and pulsed direct current (DC) power processes. In this conference, similar to ICCG in 1996, persuasive reports will be presented on various methods that may prove interesting when applied to specific large format sputtering processes. These processes are the result of more than 20 years of research and development, marketing and production experience within the glass coating industry. The processes generating the most interest (and discussion) today increasingly involve an AC or switched and controlled DC power source.
Keywords:plasma processing;sputtering