TiNxOy films were deposited on glass by a reactive DC sputtering process, using a new hollow cathode with a cavity of 1.4 cm(3) The discharge processes inside the cavity produces large densities of both sputtered and evaporated titanium particles and strongly affect the reactive processes for formation of titanium oxinitride film. The particles contributing to the film growth are ionized inside the cavity and ejected into the plasma chamber through a 5-mm nozzle, due to a pressure difference. The inner walls of the cavity were made of pure titanium. Pure argon was used as an operating gas, and a mixture of nitrogen and oxygen was added as a reactant gas (20% O-2/80% N-2) At an operating pressure of 0.05 torr (6.65 Pa), several samples with a thickness of a few microns were produced. Optical emission spectroscopy was used to examine the plasma parameters. The him's structure was examined by X-ray diffraction methods showing the main peaks of (111), (200), and (220), Atomic force microscopy was used to investigate the surface morphology of the films. The samples were analyzed by energy dispersive X-ray spectroscopy and Auger electron spectroscopy, and a composition of Ti(40)N(20)O(40) was deduced. Measurements showed a microhardness of 1100 kp/mm(2) and a surface roughness of 2.510 nm for this film.