A new method for the preparation of double silver layer systems with ultra-low resistance and high visible transmittance for use as low-emissivity (low -E) coatings, low resistance transparent electrodes for display applications and also electromagnetic interference (EMI) shieldings in plasma display panel (PDP) applications has been successfully developed. in this paper, the results of an optimization of the deposition conditions of both oxide layers and metallic layers using indium-tin oxide (ITO) and indium-cerium oxide (ICO) as transparent oxides and a silver alloy as a metallic layer are illustrated.