This paper reviews the recent progress in the catalytic chemical vapor deposition (Cat-CVD) research project, supported by the New Energy and Industrial Technology Development Organization (NEDO). Based on the results obtained in the project, firstly, the deposition mechanism of Cat-CVD is discussed, together with fundamental issues required for making a deposition apparatus. Secondly, the properties of Cat-CVD Si-based thin films such as amorphous silicon (a-Si), polycrystalline silicon (poly-Si), and silicon nitride (SiNx) films are demonstrated. Finally, the feasibility of such films for device application is discussed.