Polyimide (C22H10N2O5)(n) was implanted with Bi+ and Fe+ ions at different energies, doses, and angles. The depth distribution of implanted Bi+ and Fe+ ions in polyimide was measured by Rutherford backscattering. The results show: (1) For the case of 2x10(15) Bi+ ions/cm(2) the depth distribution was nearly Gaussian for both energies; for the case of 1 x 10(16) Bi+ ions/cm(2), diffusion behavior during implantation is observed. (2) For the case of 1x10(16) Fe(+)ions/cm(2), the depth distribution was Gaussian for 200 keV, and the depth distributions of the as-implanted Fe+ ions become bimodal and have a split behavior under 0 degrees and 45 degrees for 350 keV. (3) For a regular distribution, the experimental mean-projected range is in good agreement with the calculated value, within less than 6%, the experimental range straggling is larger than the calculated one based on TRIM'98.