A novel antistiction method using harmonic excitation on the microstructure is presented. We exploit a simplified model consisting of a single-degree-of-freedom mass-damping-spring system to simulate the drying process of the microstructure. Based on this proposed method, we can predict the dynamic response of the microstructure including the resonant frequency and the damping characteristic of the drying system. And then adequate harmonic excitation is applied to release the microstructure during drying process. Silicon dioxide beams with 0.7-/-mum-thick, 16-mum-wide, 120-mum-long, 4 mum gap. were released successfully by this method. Theoretical predictions of the dynamic behavior of microstructures during the drying process agree well with experimental results. The proposed approach effectively improves the yield rate of the microstructure without additional masks and complicated process during the postetch release process.