Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.19, No.2, 600-600, 2001 Export Citation Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse (vol 18, pg 3313, 2000) Goldfarb DL, de Pablo JJ, Nealey PF, Simons JP, Moreau WM, Angelopoulos M Please enable JavaScript to view the comments powered by Disqus.
