We propose a multicolumn and multibeam electron beam direct write lithography scheme using arrays of cold cathode emitters as the electron source. The conceptual design and the requirements for the field emitters in this application will be described. We have fabricated and tested both silicon field emitters and Spindt-type metal field emitters. Tip current stability was improved by pulse conditioning. Patterns with 117 nm feature sizes were written on poly(methylmethacrylate) photo resist.