An experimental model of a micropinch (vacuum spark) x-ray source was tested in x-ray lithography and x-ray microscopy applications. The image resolution for the proximity lithography and microscopy methods with the micropinch source was estimated. The proximity lithography with positive and negative resists was tested in vacuum; a protection system, shielding a mask from the discharge plasma blowoff, metallic debris, and extreme ultraviolet (EUV) radiation, was installed in front of the mask. Images of the biological specimens were also obtained with x-ray resists for one-pulse exposure and a series of pulses. The effect of microrelief leveling (polishing) of the solid surfaces irradiated by the high-power pulsed soft x-ray/EUV flux was observed experimentally, and an analytical model of the effect was suggested. The effect of structural modification of the thin layers irradiated by the high power EUV flux was predicted, and the transformation of the dielectric buffer layers from the amorphous to the crystalline state was realized experimentally.