Previous Article Next Article Table of Contents Journal of Materials Science Letters, Vol.18, No.9, 743-746, 1999 DOI10.1023/A:1006616917188 Export Citation A study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications Lim CW, Bourdillon AJ, Gong H, Lahiri SK, Pey KL, Lee KH Please enable JavaScript to view the comments powered by Disqus.
