Ruthenium and osmium were deposited in submonolayer amounts on Pt(111) single crystal surfaces using the previously reported 'spontaneous deposition' procedure [Chrzanowski et al., Langmuir, 13 (1997) 5974]. Such surfaces were first explored using ex situ scanning tunneling microscopy (STM) to image the deposition characteristics of ruthenium and osmium islands on Pt(111). It was found that, using the spontaneous deposition procedure, a maximum coverage of 0.20 ML ruthenium is formed on the surface after 120 s of exposure to a RuCl3 solution in 0.1 M HClO4. A homogeneous deposition on the Pt(111) surface was found, with no observed preferential deposition on step edges or surface defect sites. In contrast, in the spontaneous deposition of osmium, osmium clusters form preferentially at, though not limited to, surface defect sites and step edges. Osmium island deposition occurs at a greater rate than ruthenium on Pt(111), and possible explanations are presented. Methanol activity on the Pt(111)/Ru and Pt(111)/Os surfaces is also studied, using the coverage values determined to yield the highest activity for methanol electro-oxidation (0.20 ML coverage for Ru and 0.15 ML for Os). At potentials more negative than 0.40 V vs. RHE, the Pt(111)/Ru surface yields a higher surface activity than Pt(111)/Os. However, at potentials more positive than 0.04 V, Pt(111)/Os exhibits demonstrably higher surface activity. The relevance of this data is discussed and future avenues of interest are indicated.