The mounting standard based upon a proposed four-pad electrostatic chuck for the 200 turn PREVAIL and SCALPEL(R) masks was assessed to support the electron-beam projection lithography (EPL) mask standardization process. Using numerical simulations, comparative studies were performed to investigate the mask response during fabrication, pattern transfer, and mounting employing the IBM Falcon/Nighteagle layout as a pattern-specific design for both EPL masks. The results indicated that consistent mounting schemes in the e-beam writer and exposure tool minimized the in-plane distortion (IPD). The proposed chucking configuration appeared to be robust for both EPL technologies for controlling IPD. With additional support enhancement beneath the major strut across the center of the grillage area of the mask, the IPD can be reduced to negligible values.