Controlled crystallization of amorphous films through "nanoprinting" is a novel pattern transfer technique that has been demonstrated for submicron features. Amorphous Ge and indium tin oxide (ITO) films are investigated for their suitability as a pattern transfer layer by direct contact with a patterned printhead. The printhead is heated and brought into contact with the amorphous film, transforming the contacted areas from amorphous to crystalline material. After crystallization, the amorphous regions are selectively etched away, leaving the desired pattern in crystalline material. Theoretical modeling suggests that this technique can be used for pattern transfer of features less than 50 nm.