Journal of Vacuum Science & Technology B, Vol.19, No.6, 2811-2815, 2001
Study of the resist deformation in nanoimprint lithography
Numerical simulations and experimental studies are carried out to understand the deformation process of thin polymer film in nanoimprint lithography. Deformation of a thin polymer above its glass transition temperature is studied for various imprinting conditions such as the aspect ratios of a mold pattern, initial thickness of the polymer, and imprinting pressure. Cross-sectional profiles of the deformed polymers are simulated by the finite element method based on a rubber elastic model. The results are compared with experimental data. The areal penetration ratio of the polymer into the recessed groove of the mold and residual thickness underneath the mold are quantitatively evaluated. The simulations and the experimental results agree well with each other. 9 2001 American Vacuum Society.