A continuous-flow method of chemical vapor deposition of tetramethoxysilane on gamma -alumina was developed for industrial utilization of silica monolayer solid-acid catalyst. The now method caused relatively heterogeneous coverage of silicon compared to the static method; higher coverage by silica was observed at the substrate bed near to the inlet of the reactor, especially in the low silicon concentration region. However, the difference in structure was small in the high silicon concentration region where the coverage reached almost 100%. The catalytic activity for double-bond isomerization of 1-butene and thermal stability obtained by the two methods were similar, showing that the continuous flow method was sufficient to prepare the silica monolayer catalyst commercially.