The generation of oxygen gas within an amorphous anodic alumina film is reported. The film was formed by anodizing aluminum, which was first electropolished and then chemically polished in CrO3-H3PO4 solution, in sodium tungstate electrolyte. The procedure results in incorporation of mobile Cr3+ species, from the chemical polishing film, and mobile W6+ species, from the electrolyte, into the amorphous structure. The tungsten species are present in the outer 27% of the film thickness, while Cr6+ species occupy a thin layer within the tungsten-containing region. Above the Cr3+ containing layer, a band develops that contains oxygen bubbles of a few nanometres size. The oxygen is generated by oxidation of O2- ions of the alumina. A mechanism of oxygen generation within the alumina is proposed based on the electronic band structure of the oxide, modified by the Cr3+ and W6+ species. and on the ionic transport processes during oxide growth.