화학공학소재연구정보센터
Journal of Materials Science, Vol.37, No.8, 1535-1539, 2002
X-ray absorption spectroscopy, simulation and modeling of Si-DLC films
Amorphous silicon-containing diamond-like carbon (Si-DLC) films were deposited on silicon wafers by Ar+ Ion Beam Assisted Deposition (IBAD) at various energy conditions. The films were examined with X-ray Absorption Near Edge Structure (XANES) spectroscopy and Extended X-ray Absorption Fine Structure (EXAFS) spectroscopy. The Si K-edge X-ray Absorption Spectroscopy (XAS) results indicate that Si-DLC films have an amorphous structure, where each Si atom is coordinated to four carbon atoms or CHn groups. This short-range order, where a Si atom is surrounded by four C atoms, was found in all Si-DLC films. The XANES spectra do not indicate Si coordination to oxygen atoms or phenyl rings, which are present in the precursor material. A structural model of Si-DLC is proposed based on XAS findings. Simulated X-ray absorption spectra of the model produced by FEFF8 show a good resemblance to the experimental data.