Organic thin films were deposited by plasma-enhanced chemical vapor deposition, using isopropyl alcohol as a precursor. The pulsed, inductively coupled plasma was characterized with in situ Langmuir probe measurements and mass spectrometry. We identify the key ionized species diffusing to the substrate and offer explanations as to how they are generated. The films were analyzed with X-ray photoelectron spectroscopy. Correlations were observed between the plasma ion mass distributions and the oxidation state of the deposited carbon.