Thin Solid Films, Vol.405, No.1-2, 23-28, 2002
Chemical vapor deposition of 6CuO center dot Cu2O films on fiberglass
To coat fiberglass with copper oxides, in particular with the paramelaconite structure 6CuO-Cu2O, we have used the chemical vapor deposition (CVD) procedure of a copper precursor. The deposition of:copper oxides was done using a horizontal-flow reactor, 2,4-pentanedionate copper(II) as precursor and O-2 as carrier-reactant gas at several deposition temperatures. In order to establish a correlation between experimental parameters and the resulting copper species, as well as film quality, the samples that were produced, were evaluated using techniques such as X-ray diffraction (XRD), visible spectrophotometry, scanning electronic microscopy (SEM) and atomic force microscopy (AFM). The most important result is that 6CuO(.)Cu(2)O thin films are obtained over a short range of deposition temperatures. The film growth of this copper phase occurred in the [202] and [004] directions.