화학공학소재연구정보센터
Thin Solid Films, Vol.409, No.1, 82-87, 2002
Decomposition behaviors of bis(N-alkoxy-p-ketoiminate) titanium complexes in the depositions of titanium oxide and barium strontium titanate films
Five bis(N-alkoxy-beta-ketoiminate) titanium complexes [Ti(ONO-1)(2): titanium bis(2-N-(2-hydroxyethylimino)-4-pentanoate), Ti(ONO-2)(2): titanium bis(2-N-(2-hydi-oxy-2-methylethylimino)-4-pentanoate), Ti(ONO-3)(2): titanium bis(2-N-(2-hydroxy-1-methylethylimino)-4-pentanoate), Ti(ONO-4)(2): titanium bis (2-N- ( 1. 1 -dimethyl-2-hydroxyethylimino)-4-pentanoate), Ti (ONO-5)(2): titanium bis(2,6-dimethyl-3-N-(2-hydi-oxy-2-methylethylimino)-5-heptanoate)] have been synthesized and tested as liquid delivery metal-organic chemical vapor deposition (MOCVD) precursors for titanium oxide (TiO2) and barium strontium titanate (BaxSr1-xTiO3, BST) thin films. It is indicated from thermogravimetric (TG) analyses that Ti(ONO-2)(2) and Ti(ONO-3)(2) leave negligible amount of residue after thermal decomposition. H-1 nuclear magnetic resonance (NMR) spectra and mass spectroscopic data imply that Ti(ONO-2), is chemically stable during the flash evaporation at 280 T. The deposition rate of TiO2 film with Ti(ONO-2)2 and Ti(ONO-3), was comparable to that with Ti(mpd)(tmhd)(2), and approximately three times that with Ti(tmhd)(2)(O-'Pr)(2) [mpd: 2-methyl-2,4-pentanedioxy, tmhd: 2,2,6,6, - tetramethyl - 3,5-heptanedionate. O/Pr: isopropoxyl. Ti(ONO-2)(2) was utilized for the deposition of a BST film with conventional Ba and Sr precursors, Ba(methd), and Sr(methd)(2) (methd: methoxy-ethoxy-tetramethyl -heptanedionate), and the as-deposited BST films showed very low carbon content, and smooth surface morphology without any impurity phase.