질산 인듐과 염화 주석으로부터 얻어진 인듐주석산화 분말의 합성에서 첨가제와 소성 조건의 영향

김순회; 김기도; 김희택; Soon Hoi Kim; Ki Do Kim; Hee Taik Kim

HWAHAK KONGHAK, Vol.40, No.4, 411-414, August, 2002

The Effect of Additive and Sintering Conditions in the Formation of ITO Powder Obtained from Indium Nitrate and Tin Chloride

김순회, 김기도 , 김희택 ^†

한양대학교 공학대학 화학공학과, 안산 425-791

Soon Hoi Kim, Ki Do Kim , and Hee Taik Kim^†

Department of Chemical Engineering, Hanyang University, Ansan 425-791, Korea

E-mail:

초록

질산 인듐[In(NO3)3ㆍ3.6H2O]과 염화주석(SnCl4ㆍ5H2O)을 용매인 에탄올(99.9%) 등에 용해시킨 후 침전제로 0.5 M 암모니아수와 첨가제인 우레아를 가하여 인듐주석산화(ITO, indium tin oxide) 분말을 합성하였다. 또한 소성 조건에 따른 ITO 분말의 입자크기 및 비 표면적 등을 살펴보았다. 실험 결과 질산 인듐의 농도가 감소할수록 입자의 크기는 감소하였으며, 우레아의 첨가에 의해 겔화 시간이 길어져 좁은 입도 분포를 지닌 응집되지 않은 작은 입자들을 얻을 수 있다는 것을 알 수 있었다. 또한, 비 표면적은 350 ℃, 1시간 조건에서 최대를 (약 98 m(2)/g) 보이다가 점차 감소하였고, 입자의 크기는 각각 350 ℃에서 1시간, 그리고 550 ℃ 30분의 조건에서 최소치를 (약 47 nm) 보였다.

To synthesize ITO powder, indium nitrate and tin chloride were first dissolved in ethanol or distilled water, and then 0.5 M NH4OH as a precipitation agent and urea as an additive were added to the solution. In addition, the effect of sintering conditions on particle size and specific surface area of product powder was observed. As a result, the particle size decreased with decreasing the concentration of indium nitrate. We also found that the non-agglomerated small particles with narrow size distribution could be observed by longer gelation time due to the addition of urea. Finally, it showed that the specific surface area has a maximum value(about 98 m(2)/g) at 350 ℃ and 1 hr condition, and the particle size has a minimum value (about 47 nm) at following conditions(350 ℃ 1 hr and 550 ℃ 30 min).

Keywords:ITO;Homogeneous Precipitation;Urea;Surface Area

[References]

Badeker K, Annu. Phys., 22, 749 (1907)
Huang D, Ho FC, Parsons RR, Appl. Opt., 35, 5080 (1996)
Woollam JA, Mcgahan WA, Johs B, Thin Solid Films, 241(1-2), 44 (1994)
Nagatomo T, Maruta Y, Omoto O, Thin Solid Films, 192, 17 (1990)
Suzuki K, Hashimoto N, Oyama T, Shimizu J, Akao Y, Kojima H, Thin Solid Films, 226, 104 (1993)
Vossen JL, Phys. Thin Films, 9, 1 (1981)
Pulker HK, Coating on Glass, Elsevier, Amsterdam, 441 (1996)
Djaoued Y, Phong VH, Badilescu S, Ashrit PV, Girouard FE, Truong VV, Thin Solid Films, 293(1-2), 108 (1997)
Furusaki T, Kodaira K, Yamamoto M, Shimada S, Matasushita T, Mater. Res. Bull., 21, 803 (1986)
Dawar AL, Joshi JC, J. Mater. Sci., 19, 1 (1984)
Pohl DW, Novotny L, Hecht B, Heinzelmann H, Thin Solid Films, 273(1-2), 161 (1996)
Jung CS, M.S. Dissertation, Hanyang, Seoul, Korea (1999)
Ryu MY, M.S. Dissertation, Hanyang Univ., Seoul, Korea (2002)

[Related Articles]

[1] Badeker K, Annu. Phys., 22, 749 (1907)

[2] Huang D, Ho FC, Parsons RR, Appl. Opt., 35, 5080 (1996)

[3] Woollam JA, Mcgahan WA, Johs B, Thin Solid Films, 241(1-2), 44 (1994)

[4] Nagatomo T, Maruta Y, Omoto O, Thin Solid Films, 192, 17 (1990)

[5] Suzuki K, Hashimoto N, Oyama T, Shimizu J, Akao Y, Kojima H, Thin Solid Films, 226, 104 (1993)

[6] Vossen JL, Phys. Thin Films, 9, 1 (1981)

[7] Pulker HK, Coating on Glass, Elsevier, Amsterdam, 441 (1996)

[8] Djaoued Y, Phong VH, Badilescu S, Ashrit PV, Girouard FE, Truong VV, Thin Solid Films, 293(1-2), 108 (1997)

[9] Furusaki T, Kodaira K, Yamamoto M, Shimada S, Matasushita T, Mater. Res. Bull., 21, 803 (1986)

[10] Dawar AL, Joshi JC, J. Mater. Sci., 19, 1 (1984)

[11] Pohl DW, Novotny L, Hecht B, Heinzelmann H, Thin Solid Films, 273(1-2), 161 (1996)

[12] Jung CS, M.S. Dissertation, Hanyang, Seoul, Korea (1999)

[13] Ryu MY, M.S. Dissertation, Hanyang Univ., Seoul, Korea (2002)