화학공학소재연구정보센터
Journal of the Electrochemical Society, Vol.149, No.5, G305-G308, 2002
A model of chemical mechanical polishing - II. Polishing pressure and speed
A model of chemical mechanical polishing is extended to include the effects of polishing pressure and speed on the polishing rate. The result predicts both Preston and non-Preston behavior in different limits. The role of pressure is affected by the material properties of the polishing pad and the workpiece surface. Rate predictions are compared to experimental data for metal and oxide polishing.