novel approach to the synthesis of thin (similar to1 mum) fully dense metallic films with nanoscale microstructure is presented. This technique is an unusual combination of two different phenomena: electroless plating and osmosis. It is remarkable that the method permits a systematic variation of film microstructure and thickness that allows for optimization of the film properties. Because the unique approach described herein can be used for synthesis of nanograined thin metal films of any desired composition, it can be employed in a variety of applications.