Previous Article Next Article Table of Contents Journal of the American Chemical Society, Vol.125, No.14, 4060-4061, 2003 DOI10.1021/ja029973k Export Citation A photocurable poly(dimethylsiloxane) chemistry designed for soft lithographic molding and printing in the nanometer regime Choi KM, Rogers JA [Referenced By] Please enable JavaScript to view the comments powered by Disqus.
