Thin Solid Films, Vol.428, No.1-2, 123-128, 2003
Angle-scanned X-ray photoelectron diffraction of clean and hydrogen terminated 2 X 1-reconstructed Si(100) surfaces
The clean and hydrogen terminated 2 X 1-reconstructed Si( 1 0 0) surfaces were investigated by surface-core level shift photoelectron diffraction at low kinetic energies. The photoelectron spectra contain shifted components due to the different environment of the atoms at the surface. Photoelectron diffraction patterns were recorded for the full solid angle above the sample. The diffraction patterns show different intensity distributions for the different shifted spectral components indicating their local environment. A comparison of experimental and calculated patterns for model structures clearly allows to assign the shifted components to distinct dimer atoms at the Si-surface.
Keywords:silicon;surface structure;photoelectron spectroscopy;photoelectron diffraction;chemical shift