Photomasks are currently fabricated using the lithographic process, which is complex and time consuming because of several steps involved in the fabrication process. In order to address this a simple technique is proposed in this article which is a single-step process. The required pattern is transferred to mask blank by direct writing with ultrashort laser pulses without the aid of photoresist. A nonmechanical scanning system immune to effects of vibration has been developed in order to scan the laser beam with high positional accuracy and scan speed. It is a cost effective technique when compared with the lithographic process and is capable of fabricating photomasks with submicron features. (C) 2003 American Vacuum Society.