Journal of Industrial and Engineering Chemistry, Vol.9, No.4, 398-402, October, 2003
Preparation and Photopolymerization of 22-Tricosenol Langmuir-Blodgett Films
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Amphiphilic monomer, 22-tricosenol was synthesized from the reduction of 22-tricosenoic acid. The stability of 22-tricosenol monolayer was investigated and compared with that of the 22-tricosenoic acid monolayer. The 22-tricosenol monolayer was deposited on solid substrates, such as KRS-5 (TiBr/TiI) and silicon wafer, by employing Langmuir-Blodgett (LB) technique under the deposition condition of 23 ℃, pH 5.4, and the surface pressure of 33 mN/m. The polymerization of the 22-tricosenol monomer LB films was carried out by UV-irradiation for 240 seconds. The polymerized LB film was insoluble in ethanol and acetone which were good solvents for the monomer LB film. The negative resist pattern was generated by exposing the masked monomer LB film to UV-irradiation followed by dissolving the unirradiated part with ethanol.
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