A novel hot-wire chemical vapor deposition (HW-CVD) geometry was employed to study the deposition of Teflon-like films from hexafluoropropylene oxide (HFPO). In this configuration hot wires were replaced by thin ribbons, and under proper operating conditions the complex HW-CVD geometry is simplified to a one-dimensional system. The kinetics of both HFPO decomposition and Teflon deposition were measured as a function of operating conditions. A hybrid 2-D CFD/1-D stagnation flow model was used to interpret the results. At relatively low ribbon temperatures good agreement between model and experiment was observed. Deviations observed at higher ribbon temperatures were attributed to gas-phase polymerization of CF2 moieties, and participation of these oligomers in the deposition process. (C) 2003 Elsevier Science B.V. All rights reserved.