화학공학소재연구정보센터
Thin Solid Films, Vol.437, No.1-2, 95-100, 2003
Crystallized SrFeO3-x films deposited by pulsed laser ablation without in-situ substrate heating
Crystallized SrFeO3-x (0less than or equal toxless than or equal to0.5) films were deposited by pulsed laser ablation without in-situ substrate heating with the third harmonic of a Nd:YAG laser and off-axis configuration. The crystallinity of SrFeO3-x films strongly depended on the ambient pressure of Ar gas. The films deposited are amorphous below 10 Pa, and crystalline from 10 to 200 Pa. The films deposited at 30 Pa have the optimum stoichiometry of Sr to Fe, approximately 1.05. A stoichiometric and well-crystallized SrFeO3 film with a smooth surface was fabricated by post-annealing (300 degreesC in air) the amorphous films deposited at 1 Pa. (C) 2003 Elsevier Science B.V. All rights reserved.