Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD (vol 430, pg 110, 2003)

Bouree JE; Guillet J; Grattepain C; Chaumont J

Thin Solid Films, Vol.440, No.1-2, 294-294, 2003

DOI10.1016/S0040-6090(03)00917-9 Export Citation

Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD (vol 430, pg 110, 2003)

Bouree JE, Guillet J, Grattepain C, Chaumont J