A relative approach, based on the dynamic density functional theory, for simulating the solvent evaporation rate dependence of self-assembly process of block copolymers in solution is proposed. The di- and triblock copolymers are first chosen as the candidates for exploration of novel microstructures. The results reveal that asymmetrical block copolymers with unequal block length, which generally exhibit disordered microdomain patterns in melts, have the ability to assemble into periodic ordered microdomain patterns by properly controlling solvent evaporation rate, e.g., diblock copolymers may assemble into lamellar microstructures with lamellar thickness proportional to individual block length. This simulation suggests a strategy of design and manufacture of polymeric nanomaterials with novel microstructures. (C) 2003 American Institute of Physics.