Electron attachment to PSCl3 was studied in 133-Pa pressure of helium gas at temperatures from 298-550 K. Measurements of rate constants and branching fractions were made in a flowing-afterglow Langmuir-probe (FALP) apparatus. These experiments yielded an electron attachment rate constant of 5.1x10(-8) cm(3) s(-1) that was found not to change significantly in the 298-550 K temperature range. This rate constant represents an attachment efficiency of about 14%. Attachment in 133 Pa of He gas yielded only the dissociative ion products PSCl2- and Cl-. The FALP data suggest that there is an activation energy of about 17 meV for production of PSCl2-. Attachment to PSCl3 was also studied at high pressure (9-93 kPa) of N-2 in an ion mobility mass spectrometer, at 298 K. In contrast to the low-pressure data, the parent anion product channel (PSCl3-) was observed (along with the dissociative channels), and increased in importance with N-2 pressure. Gaussian-3 (G3) calculations were carried out for PSCl3 and PSCl2 neutrals and anions to aid in interpretation of the experimental results. The calculations indicate that the electron affinity EA(PSCl2) is slightly smaller than EA(Cl), which may account for the observed branching fractions for PSCl2- and Cl- in the low-pressure experiments. A natural population analysis was performed to obtain the charges associated with each atom in the molecules in order to estimate how the attached electron is distributed. Comparison is made between the present study of electron attachment to PSCl3 and our earlier work on attachment to POCl3, and G3 calculations are reported here for neutral and anionic POCl2 and POCl3. In contrast to PSCl2, the calculations imply that EA(POCl2) is slightly greater than EA(Cl). For both PSCl3 and POCl3, the calculations show that the dissociative electron attachment process is close to thermoneutral. (C) 2004 American Institute of Physics.