Journal of the Korean Industrial and Engineering Chemistry, Vol.15, No.1, 11-16, February, 2004
MCM-41의 표면 특성이 Cr(III)과 Cr(VI)의 흡착거동에 미치는 영향
Influence of Surface Properties of MCM-41 on Cr(III) and Cr(VI) Adsorption Behaviors
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초록
본 연구에서는 실리카 원으로 colloidal silica를 이용하고, template로 cetyltrimethylammonium chloride (CTMACI)를 사용하여 MCM-41을 수열 합성하였다. MCM-41의 표면 성질과 구조는 pH, 산/염기도, FT-IR, XRD, 그리고 TEM을 이용하여 살펴보았다. 비표면적(SBET), 전체 기공부피(Vr), 그리고 평균 기공지름(DBJH)을 포함하는 N2등온 흡착 특성은 BET식과 de Boer의 t-plot을 이용하여 확인하였다. 또한, MCM-41의 Cr(III)와 Cr(VI) 흡착량은 ICP와 UV 분광기를 이용하여 측정하였다. 그 결과, MCM-41의 산도가 염기도 보다 더 높았으며, -OH, Si-OH, Si-O-Si와 같은 표면 작용기들을 IR로 확인할 수 있었다. N2등온 흡착 결과 SBET는 803 m2/g이었으며, 평균 기공 크기는 29 Å이었고, 벽 두께는 기공 크기와 a0의 차이로부터 22.5 Å임을 알 수 있었다. MCM-41의 Cr 이온 흡착온 용액의 pH 변화에 의존하였고, Cr(VI)보다 Cr(III)가 더 좋은 흡착 거동을 보였다.
In this work, MCM-41 mesoporous materials were prepared from hydrothermal synthesis using gel mixture of colloidal silica solution as silica source and cetyltrimethylammonium chloride (CTMACI) as a template. The surface and structure properties of MCM-41 were determined by pH, acid/base value, FT-IR, XRD, and TEM. N2adsorption isotherm characteristics, including the specific surface area (SBET), total pore volume (Vr), and average pore diameter (DBJH), were determined by BET and de Boer's t-plot methods. Also, the adsorption amounts of Cr(III) and Cr(VI) ion on MCM-41 were measured using ICP and UV spectrometer. As a result, the acidity of MCM-41 had higher than the basicity of one and surface functional groups, such as, -OH, Si-OH, Si-O-Si were observed by IR measurement. A SBET of 803 m2/g was determined from the N2 adsorption isotherm. Also, the average pore diameter of 29 Å was obtained and the wall thickness of the MCM-41, given by the difference of a0 and the pore diameter, was 22.5 Å. The adsorption of Cr ions on the MCM-41 become different depending on the pH of solution. The adsorption amount of Cr(III) on MCM-41 had higher than that of Cr(VI).
- Bansal RC, Donnet JB, Stoeckli F, Active Carbon, Marcel Dekker, New York (1988)
- deMatos AT, Fontes MPF, daCosta LM, Martinez MZ, Environ. Pollut., 111, 429 (2001)
- Matheickal JT, Yu QM, Bioresour. Technol., 69(3), 223 (1999)
- Arienzo M, Chiarenzelli J, Scrudato R, J. Hazard. Mater., B87, 187 (2001)
- Dong D, Hua X, Li Y, Li Z, Environ. Pollut., 119, 317 (2002)
- Steenkamp GC, Neomagus HWJP, Krieg HM, Keizer K, Sep. Purif. Technol., 25, 407 (2001)
- Park SJ, Kim JS, J. Colloid Interface Sci., 239(2), 380 (2001)
- Filho NLD, Gushikern Y, Polito WL, Moreira JC, Ehirim EO, Talanta, 42, 1625 (1995)
- Sing KSW, Everett DH, Haul RAW, Moscou L, Pierotti RA, Rouquol J, Siemieniewska T, Pure Appl. Chem., 57, 603 (1985)
- Hwang EY, Kim JR, Choi JK, Woo HC, Park DW, J. Anal. Appl. Pyrolysis, 62, 351 (2002)
- Joshi UD, Joshi PN, Tamhankar SS, Joshi VP, Idage BB, Joshi VV, Shiralkar VP, Thermochim. Acta, 387(2), 121 (2002)
- Park SJ, Jung WY, J. Colloid Interface Sci., 243(2), 316 (2001)
- Kresge CT, Leonowicz ME, Roth WJ, Vartuli JC, Beck JS, Nature, 359, 710 (1992)
- Beck JS, Vartuli JC, Roth WJ, Lenowicz ME, Kresge CT, Schmitt KD, Chu CTW, Olsen DH, Sheppard EW, McCullen SB, Higgins JB, Schlenker JL, J. Am. Chem. Soc., 114, 10834 (1992)
- Ryoo R, Ko CH, Park IS, Chem. Commun., 1413 (1999)
- Kumar D, Schumacher K, vonHohenesche DF, Grun M, Unger KK, Colloids Surf. A: Physicochem. Eng. Asp., 187, 109 (2001)
- Davydov L, Reddy EP, France P, Smirniotis PG, J. Catal., 203(1), 157 (2001)
- Kim JH, Kwak JH, Jun SN, Ryoo R, J. Phys. Chem., 199, 16742 (1995)
- Boehm HP, Adv. Catal., 16, 178 (1966)
- Brunauer S, Emmett PH, Teller E, J. Am. Chem. Soc., 60, 309 (1938)
- Lippens BC, deBoer JH, J. Catal., 4, 319 (1965)
- Bronnimann CE, Zeigler RC, Maciel GE, J. Am. Chem. Soc., 110, 2023 (1988)
- Mafarlan AJ, Morrow BA, J. Phys. Chem., 95, 5388 (1991)
- Chuang S, Kinney DR, Bronnimznn CE, Zeigler RC, Macial GE, J. Phys. Chem., 96, 4027 (1992)
- Park SJ, Interfacial Forces and Fields: Theory and Applications, ed. J.P. Hsu, Marcel Dekker, New York (1999)
- Hohl H, Stumm W, J. Colloid Interface Sci., 55, 281 (1976)
- Asuero AG, Int. J. Pharm., 34, 1 (1996)
- Park SJ, Jang YS, J. Colloid Interface Sci., 249(2), 458 (2002)
- Goswamee RL, Sengupta P, Bhattacharyya KG, Dutta DK, Appl. Clay Sci., 13, 21 (1998)